Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.11779/1494
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dc.contributor.authorZhao, Chun-
dc.contributor.authorMustafazade, Arif-
dc.contributor.authorPandit, Milind-
dc.contributor.authorSeshia A, Ashwin-
dc.contributor.authorSobreviela, Guillermo-
dc.contributor.authorZou, Xudong-
dc.date.accessioned2021-06-16T10:24:15Z
dc.date.available2021-06-16T10:24:15Z
dc.date.issued2021-
dc.identifier.citationPandit, M., Mustafazade, A., Sobreviela, G., Zhao, C., Zou, X., & Seshia, A. A. (21 May 2021). Experimental Observation of Temperature and Pressure Induced Frequency Fluctuations in Silicon MEMS Resonators. Journal of Microelectromechanical Systems. p. 1-6.en_US
dc.identifier.issn1057-7157-
dc.identifier.issn1941-0158-
dc.identifier.urihttps://hdl.handle.net/20.500.11779/1494-
dc.identifier.urihttps://doi.org/10.1109/JMEMS.2021.3077633-
dc.description.abstractSilicon MEMS resonators are increasingly being adopted for applications in timing and frequency control, as well as precision sensing. It is well established that a key limitation to performance is associated with sensitivity to environmental variables such as temperature and pressure. As a result, technical approaches to address these factors such as vacuum sealing and ovenization of the resonators in a temperature controlled system have been introduced. However, residual sensitivity to such effects can still serve as a significant source of frequency fluctuations and drift in precision devices. This is experimentally demonstrated in this paper for a precision oven-controlled and vacuum-sealed silicon resonators. The frequency fluctuations of oscillators constructed using two separate nearly-identical co-located resonators on the same chip are analysed and differential frequency fluctuations are examined as a means of reducing the impact of common-mode effects such as temperature and pressure. For this configuration, our results show that the mismatch of temperature and pressure coefficients between the resonators ultimately limits the frequency stability.en_US
dc.description.sponsorshipNatural Environment Research Council; Innovate U.K.en_US
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectSemiconductor device measurementen_US
dc.subjectResonatorsen_US
dc.subjectSilicon memsen_US
dc.subjectFrequency measurementen_US
dc.subjectTemperature sensorsen_US
dc.subjectResonant frequencyen_US
dc.subjectSiliconen_US
dc.subjectNoise processesen_US
dc.subjectTemperature measurementen_US
dc.subjectPressure dependenceen_US
dc.subjectTemperature dependenceen_US
dc.titleExperimental Observation of Temperature and Pressure Induced Frequency Fluctuations in Silicon Mems Resonatorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JMEMS.2021.3077633-
dc.identifier.scopus2-s2.0-85107193670en_US
dc.authoridArif Mustafazade / 0000-0003-1724-6253-
dc.description.woscitationindexScience Citation Index Expanded-
dc.identifier.wosqualityQ2-
dc.description.WoSDocumentTypeArticle
dc.description.WoSInternationalCollaborationUluslararası işbirliği ile yapılan - EVETen_US
dc.description.WoSPublishedMonthAğustosen_US
dc.description.WoSIndexDate2021en_US
dc.description.WoSYOKperiodYÖK - 2020-21en_US
dc.identifier.scopusqualityQ1-
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.identifier.startpage1-6en_US
dc.departmentMühendislik Fakültesi, Elektrik Elektronik Mühendisliği Bölümüen_US
dc.relation.journalJournal of Microelectromechanical Systemsen_US
dc.identifier.wosWOS:000673501700002en_US
dc.institutionauthorMustafazade, Arif-
item.cerifentitytypePublications-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.openairetypeArticle-
item.languageiso639-1en-
item.grantfulltextembargo_20400101-
item.fulltextWith Fulltext-
Appears in Collections:Elektrik Elektronik Mühendisliği Bölümü Koleksiyonu
Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection
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